Isi ngwaahịa
High Purity ISO Graphite na-emepụta site na Cold Isostatic Pressing (CIP) iji nweta densification otu 3D n'okpuru ultra -oke nrụgide (140-200 MPa). Emere site na mmanụ ala coke sachara na ihe karịrị ogo 2500, ọ na-egosipụta nso{6}} njupụta usoro iwu yana ezigbo isotropy, na-ahụ na arụmọrụ kwụsiri ike n'ofe ngwa dị iche iche.
Nka nka
|
Oke |
Uru isi |
|
Njupụta |
1.80–1.92 g/cm³ |
|
Ọdịnaya Ash |
Ihe na-erughị ma ọ bụ haha na 100ppm |
|
Ọnụego Anisotropy |
1.0–1.05 |
|
Ọnụọgụ nke Mgbasa ọkụ (CTE) |
4.2–5.0 × 10⁻⁶/K (RT-400 ogo) |
|
Ịdị ọcha |
C karịrị ma ọ bụ hà nhata 99.9% |
|
Thermal conductivity |
110–130 W/(m·K) |
|
Ike Flexural |
55–85 MPa |
Ngwaahịa na-akwado nhazi ahaziri onwe ahaziri.
Atụmatụ isi
- Ultra- ịdị ọcha dị elu: Ultra-ụ dị ala ash/metal adịghị ọcha (Fe, Ca, Na), ICP{2}}MS kwadoro, dabara adịghị ọcha- ubi nwere mmetụta.
- Njupụta dị oke mma: nnukwu njupụta dị elu, obere porosity, ịkwalite conductivity thermal na ikike igwe.
- Isotropy: Obere dị iche iche na mgbasawanye ọkụ / ike mgbanwe n'ofe ntụziaka.
- Oke okpomoku na-eguzogide: Kwụsie ike n'ogo dị elu na ikuku inert (mkpuchi dị mkpa na gburugburu oxidizing n'elu oge ụfọdụ).
- Nguzogide ujo okpomọkụ: Na-egbochi mgbanwe ọkụ ngwa ngwa na-enweghị mgbawa.
- Igwe eji arụ ọrụ nke ọma: Eserese dị elu ISO Graphite na-egosipụta nnabata siri ike yana enwere ike ịhazi ya ka ọ bụrụ akụkụ dị mgbagwoju anya (turbine disks, crucibles).
Ngwa igodo
- Semiconductor: Monocrystalline silicon furnace thermal components/ndị na-ebu wafer (oke okpomọkụ-eguzogide, ultra- adịghị ọcha dị ala).
- Fotovoltaic: Polysilicon ingot crucibles/heater (na-eguzogide ozize na-agbaze silicon).
- Ike nuklia: Igwe ọkụ dị elu-okpomọkụ- jụrụ oyi neutron reflectors (zutere nuklea -ọkwa ọkwa).
- Aerospace: Rọket nozzlel ntinye / ngwu ngwa agha (na-egbochi oke ọkụ ọkụ- mbelata okpomọkụ).
- Ọla ọla dị elu-: Titanium alloy na-agbaze crucibles (nwere ike iji ya mee ihe ọzọ, enweghị mgbapu).
- Akụrụngwa ụlọ ọrụ: EDM electrodes/akụkụ igodo ọkụ ọkụ dị elu{{0}.
Asambodo & Nhazi
Elu ịdị ọcha ISO Graphite zutere SEMI F76 (semiconductor), ISO 8005 (nuklia), EN 10298/ASME BPVC (nchekwa), na ụkpụrụ RoHS 3.0 (gburugburu mpaghara). Ọrụ omenala gụnyere: silicidation (iji kwalite nkwụsi ike oxidation), impregnation nke abụọ (iji kwalite njupụta), na ultra-mmalite nhazi dị mma (iji kwalite ike).


Ihe nchịkọta dị ọkụ: Elu ịdị ọcha ISO Graphite, China High Purity ISO ndị na-emepụta ihe eserese
